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フルテキストURL2008010170.pdf ( 502.3KB ) 公開日 2010-04-16
タイトルSpatial control of processing plasmas in a multicusp plasma source equipped with a movable magnetic filter
作成者Fukumasa, Osamu
Naitou, Hiroshi
Sakiyama, Satoshi
作成者ヨミフクマサ, オサム
ナイトウ, ヒロシ
サキヤマ, サトシ
作成者別表記福政, 修
内藤, 裕志
崎山, 智司
作成者所属山口大学大学院理工学研究科(工学)
内容記述(抄録等)It is confirmed, with the use of both a movable magnetic filter and a plasma grid, that plasma parameters (H_2-CH_4 or Ar-CH_4 plasmas) are spatially well controlled. At any filter position, plasma parameters change steeply across the magnetic filter. Then, a plasma source is divided into two parts, i. e. a source plasma region (high density plasma with energetic electrons) and a diffused plasma region (low density and low temperature plasma without energetic electrons). The former is suitable for producing the reactive species and the latter for preparing thin films. In addition, plasma parameters in the diffused plasma are controlled by changing the plasma grid potential. The role of the magnetic filter (i. e. preferential reflection of energetic electrons) is also discussed by computer simulation.
本文言語eng
著者キーワードPlasma processing
Multicusp plasma source
Magnetic filter
Electron energy distribution function
Spatial control
資料タイプtext
ファイル形式application/pdf
出版者電気学会
出版者ヨミデンキ ガッカイ
NII資料タイプ学術雑誌論文
査読の有無査読あり
ISSN0385-4205
NCIDAN10136312
掲載誌名電気学会論文誌. A, 基礎・材料・共通部門誌
掲載誌名別表記The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals and Materials Society
111
12
開始ページ1057
終了ページ1063
発行日1991
関連情報URL(HasVersion)http://www.jstage.jst.go.jp/browse/ieejfms/-char/ja/
関連情報URL(IsPartOf)http://www.iee.or.jp/
著者版/出版社版出版社版
リポジトリID2008010170
地域区分山口大学
URIhttp://www.lib.yamaguchi-u.ac.jp/yunoca/handle/2008010170