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フルテキストURL2008010063.pdf ( 1.2MB ) 公開日 2010-04-16
タイトルPressure dependence of negative hydrogen ion production in a cesium seeded tandem volume source
作成者Fukumasa, Osamu
Niitani, Eiji
作成者ヨミフクマサ, オサム
ニイタニ, エイジ
作成者別表記福政, 修
作成者所属山口大学大学院理工学研究科(工学)
内容記述(抄録等)Effects of cesium vapor injection on H^- production in a tandem volume source are studied numerically as a function of plasma parameters. Model calculation is performed by solving a set of particle balance equations for steady-state hydrogen discharge plasmas. Here, the results with a focus on gas pressure and electron temperature dependences of H^- volume production are presented and discussed. Considering H^- surface production caused by both H atoms and positive hydrogen ions, enhancement of H^- production and pressure dependence of H^- production observed experimentally are qualitatively well reproduced in the model. For enhancement of H^- production, however, so-called electron cooling is not very effective if plasma parameters are initially optimized with the use of a magnetic filter.
本文言語eng
著者キーワードtandem negative ion source
source modeling
magnetic filter
volume production
vibrationally excited molecules
cesium vapor injection
surface production
資料タイプtext
ファイル形式application/pdf
出版者応用物理学会
出版者ヨミオウヨウ ブツリ ガッカイ
NII資料タイプ学術雑誌論文
査読の有無査読あり
ISSN0021-4922
NCIDAA10650595
掲載誌名Japanese journal of applied physics. Pt. 2, Letters
35
11B
開始ページL1528
終了ページL1531
発行日1996-11
DOIinfo:doi/10.1143/JJAP.35.L1528
関連情報URL(IsPartOf)http://www.ipap.jp/jjap/index.htm
著者版/出版社版著者版
リポジトリID2008010063
地域区分山口大学
URIhttp://www.lib.yamaguchi-u.ac.jp/yunoca/handle/2008010063