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タイトルMeasurement of a three-dimensional distribution of microwave electric field in electron cyclotron resonance plasmas
作成者Furuse, Muneo
Tamura, Hitoshi
Watanabe, Seiichi
Fukumasa, Osamu
作成者ヨミフルセ, ムネオ
タムラ, ヒトシ
ワタナベ, セイイチ
フクマサ, オサム
作成者別表記福政, 修
作成者所属山口大学大学院理工学研究科(工学)
内容記述(抄録等)We have developed an apparatus that can measure the three-dimensional distribution of microwave electric field intensity in electron cyclotron resonance (ECR) plasmas. The reflection edge of the incident microwaves depends on the plasma density in the etching chamber: it is the ECR zone when the electron density (n_e) is above 1×10^11 cm^-3 and the electrode when n_e is below 1×10^11 cm^-3. The spatial distribution of the ion saturation current density at the electrode is the same as that of the microwave electric field intensity at the ECR zone. Therefore, in order to obtain uniform ion saturation current density, the intensity of the microwave electric field at the ECR zone must be kept uniform.
本文言語eng
著者キーワードetching plasma
electron cyclotron resonance
control of ECR plasma
microwave electric field
wave propagation
uniform plasma
資料タイプtext
出版者応用物理学会
出版者ヨミオウヨウ ブツリ ガッカイ
NII資料タイプ学術雑誌論文
査読の有無査読あり
ISSN0021-4922
NCIDAA10457675
掲載誌名Japanese journal of applied physics. Pt. 1, Regular papers & short notes
36
7B
開始ページ4617
終了ページ4619
発行日1997-07
DOIinfo:doi/10.1143/JJAP.36.4617
関連情報URL(IsPartOf)http://www.ipap.jp/jjap/index.htm
著者版/出版社版その他
リポジトリID2008010188
地域区分山口大学
URIhttp://www.lib.yamaguchi-u.ac.jp/yunoca/handle/2008010188