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フルテキストURL2008010119.pdf ( 547.6KB ) 公開日 2010-04-16
タイトルStudy of argon additive in a beam injection type negative ion source using VUV emission spectroscopy
作成者Nakada, Naoki
Fukumasa, Osamu
作成者ヨミナカダ, ナオキ
フクマサ, オサム
作成者別表記福政, 修
作成者所属山口大学大学院理工学研究科(工学)
内容記述(抄録等)Effects of Ar addition are studied by using a beam injection type negative ion source. With adding Ar, I_<H-> increases at low base H_2 pressure. At high base H_2 pressure, however, I_<H-> decreases. VUV emission intensities also decrease at high base pressure. In other words, Ar addition is adverse effect for production of H_2 (v''). Therefore, decrease in I_<H-> is caused by decrease in H_2 (v''). In D_2 plasmas, variation patterns of plasma parameters and VUV intensities by Ar addition are nearly the same as ones in H_2 plasmas. Even in low base pressure, however, enhancement of I_<D-> is not observed.
本文言語eng
著者キーワードVolume negative ion sources
VUV emission
Vibrationally excited molecules
資料タイプtext
ファイル形式application/pdf
出版者Elsevier
NII資料タイプ学術雑誌論文
査読の有無査読あり
ISSN0040-6090
NCIDAA00863068
掲載誌名Thin solid films
506-507
開始ページ536
終了ページ540
発行日2006
DOIinfo:doi/10.1016/j.tsf.2005.08.138
関連情報URL(IsPartOf)http://www.sciencedirect.com/science/journal/00406090
著者版/出版社版著者版
リポジトリID2008010119
地域区分山口大学
URIhttp://www.lib.yamaguchi-u.ac.jp/yunoca/handle/2008010119