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フルテキストURL2007010009.pdf ( 663.5KB ) 公開日 2010-04-16
タイトルProduction of highly uniform electron cyclotron resonance plasmas by distribution control of the microwave electric field
作成者Furuse, Muneo
Watanabe, Seiichi
Tamura, Hitoshi
Fukumasa, Osamu
作成者ヨミフクマサ, オサム
作成者別表記福政, 修
作成者所属山口大学大学院理工学研究科(工学)
内容記述(抄録等)We have developed the apparatus that can measure the three-dimensional distribution of microwave electric field intensity in electron cyclotron resonance (ECR) plasmas to investigate production and control of ECR plasmas. The relationship between the plasma properties of ECR plasmas and the microwave electric field intensity in plasmas is studied. We have confirmed that the pattern of the radial distribution of the ion saturation current at the electrode is the same as that of the microwave electric field intensity at the ECR zone. If the distribution of microwave electric field intensity at the ECR zone is uniform, the distribution of plasma density on the electrode becomes uniform, even if the distribution of microwave electric field intensity of the other zone is not uniform. Therefore, in order to obtain the optimum distribution of plasma density on the electrode, the distribution of microwave electric field intensity at the ECR zone must be controlled.
本文言語eng
資料タイプtext
ファイル形式application/pdf
出版者American Vacuum Society
NII資料タイプ学術雑誌論文
査読の有無査読あり
ISSN0734-2101
NCIDAA10635514
掲載誌名Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
17
6
開始ページ3225
終了ページ3229
発行日1999-11
DOIinfo:doi/10.1116/1.582046
関連情報URL(IsPartOf)http://www.avs.org/literature.jvst.a.aspx
著者版/出版社版出版社版
リポジトリID2007010009
地域区分山口大学
URIhttp://www.lib.yamaguchi-u.ac.jp/yunoca/handle/2007010009