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タイトルHigh-rate deposition of Co-Cr films with perpendicular magnetic anisotropy by ECR sputtering
作成者Yamamoto, Setsuo
Wada, Hirofumi
Kurisu, Hiroki
Matsuura, Mitsuru
作成者ヨミヤマモト, セツオ
ワダ, ヒロフミ
クリス, ヒロキ
マツウラ, ミツル
作成者別表記山本, 節夫
栗巣, 普揮
作成者所属山口大学大学院理工学研究科(工学)
内容記述(抄録等)A sputtering apparatus using electron-cyclotron-resonance microwave plasma (ECR sputtering apparatus) was modified to increase the deposition rate of Co-Cr perpendicular magnetic anisotropy films. Microwave was introduced into plasma generation chamber in parallel to the magnetic field. The sputtering targets and the substrate were placed in an on-axis configuration. The deposition rate of 12.8 nm/min. was achieved using the modified ECR sputtering apparatus. It was found that a 40 nm thick Co-Cr, single-layered film with a perpendicular coercivity of 2000 Oe could be prepared using the apparatus.
本文言語eng
著者キーワードHigh-rate deposition
ECR sputtering
Electron-cyclotron-resonance
Thin films
資料タイプtext
出版者Elsevier
NII資料タイプ学術雑誌論文
査読の有無査読あり
ISSN0304-8853
NCIDAA00701394
掲載誌名Journal of magnetism and magnetic materials
235
1-3
開始ページ133
終了ページ137
発行日2001
DOIinfo:doi/10.1016/S0304-8853(01)00324-9
関連情報URL(IsPartOf)http://www.sciencedirect.com/science/journal/03048853
著者版/出版社版その他
リポジトリID2008010394
地域区分山口大学
URIhttp://www.lib.yamaguchi-u.ac.jp/yunoca/handle/2008010394