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フルテキストURL2008010374.pdf ( 3.5MB ) 公開日 2010-04-16
タイトルReactive ECR-Sputter-Deposition of Ni-Zn ferrite thin-films for backlayer of PMR media
作成者Wada, Hirofumi
Yamamoto, Setsuo
Kurisu, Hiroki
Matsuura, Mitsuru
作成者ヨミワダ, ヒロフミ
ヤマモト, セツオ
クリス, ヒロキ
マツウラ, ミツル
作成者別表記山本, 節夫
栗巣, 普揮
作成者所属山口大学大学院理工学研究科(工学)
内容記述(抄録等)A reactive sputtering method using an Electron-Cyclotron-Resonance (ECR) microwave plasma was used to deposit Ni-Zn ferrite thin-films for a soft magnetic backlayer of Co-containing spinel ferrite thin-film perpendicular magnetic recording (PMR) media. The Ni-Zn spinel ferrite thin-films with a preferential orientation of (100) and a relatively low coercivity of 15 Oe were obtained at a high deposition rate of 14 nm/min and at a temperature below 200 degrees C. Although post-annealing treatment in air at 200 degrees C was effective to decrease the coercivity of the Ni-Zn ferrite thin-films, the saturation magnetization and initial permeability decreased and the surface smoothness was deteriorated simultaneously. The Ni-Zn ferrite thin-films prepared by ECR sputtering are promising as the backlayer of the perpendicular magnetic recording medium, but further improvement is required in terms of the soft magnetic properties, the grain size and the surface roughness.
本文言語eng
著者キーワードNi-Zn ferrite thin-film
reactive ECR sputtering
perpendicular magnetic recording
recording media
backlayer
資料タイプtext
ファイル形式application/pdf
出版者電子情報通信学会
出版者ヨミデンシ ジョウホウ ツウシン ガッカイ
NII資料タイプ学術雑誌論文
査読の有無査読あり
ISSN0916-8516
NCIDAA10826283
掲載誌名IEICE Transactions on Electronics
E86-C
9
開始ページ1846
終了ページ1850
発行日2003-09
関連情報URL(IsPartOf)http://search.ieice.org/index.html
権利関係copyright 2008 IEICE
著者版/出版社版出版社版
リポジトリID2008010374
地域区分山口大学
URIhttp://www.lib.yamaguchi-u.ac.jp/yunoca/handle/2008010374